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Karmakar, Chayan K.
- Study of Frequency and Concentration Dependence of Ultrasonic Attenuation of Nio Nanoparticle Embedded in Polyvinilidyne Fluoride
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Authors
Affiliations
1 Department of Physics, Indian Institute of Engineering Science and Technology, Shibpur, Howrah-711103, IN
1 Department of Physics, Indian Institute of Engineering Science and Technology, Shibpur, Howrah-711103, IN
Source
Journal of Pure and Applied Ultrasonics, Vol 39, No 2 (2017), Pagination: 49-54Abstract
In this work the frequency dependent attenuation coefficient of NiO embedded polyvinilidyne fluoride (PVDF) for different concentrations has been studied by the ultrasonic transmission technique. The NiO nanoparticles have been prepared by hydrothermal route and the sample was stirred with PVDF solution (by using DMF as solvent) and the thin film was prepared by slow evaporation method. The sample having different concentrations as well as neat PVDF film were taken for ultrasonic study. Then the amplitude versus time data has been collected from the ultrasonic pulsar/receiver instrument USLT 2000 by A-scan process. The readings are taken by using the transducer of central frequency 500 kHz. To convert this data in time-domain to frequency- domain, Fast Fourier transformation (FFT) has been done. From the result, the ultrasonic absorption increases with the increase of concentration of the sample for a given frequency and this is obvious as the number density of the scatterer increases. Ultrasonic absorption increases with the increase of frequency for a given concentration of the sample as the scattering increases in the Rayleigh region (λ>> a, the particle size).Keywords
Nanoparticle, Ultrasonic Absorption, FFT.Full Text
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